Unmasking Photolithography: A Versatile Way to Site-Selectively Pattern Gold Substrates

Authors

  • Matthew J. Hynes,

    1. Department of Chemistry and Center for Materials Innovation, Washington University in St. Louis, St. Louis, MO 63130 (USA)
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  • Prof. Joshua A. Maurer

    Corresponding author
    1. Department of Chemistry and Center for Materials Innovation, Washington University in St. Louis, St. Louis, MO 63130 (USA)
    • Department of Chemistry and Center for Materials Innovation, Washington University in St. Louis, St. Louis, MO 63130 (USA)
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  • This work was supported by the National Institute of Mental Health (grant number 1R01MH085495).

Abstract

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Surface chemistry: A new method for creating complex patterns on gold substrates is reported. Substrates were functionalized with nitroveratryl-protected carboxylic acid and hydroxy-terminated thiol monomers and patterned with a direct-write photolithography system to produce complex functional group gradients. In addition, two amine molecules were sequentially coupled on the substrate under spatial control (see picture).

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