Protection and Deprotection of DNA—High-Temperature Stability of Nucleic Acid Barcodes for Polymer Labeling

Authors

  • M. Sc. Daniela Paunescu,

    1. Department of Chemistry and Applied Biosciences, ETH Zurich, Wolfgang-Pauli-Strasse 10, 8093 Zurich (Switzerland)
    Search for more papers by this author
  • Dr. Roland Fuhrer,

    1. Department of Chemistry and Applied Biosciences, ETH Zurich, Wolfgang-Pauli-Strasse 10, 8093 Zurich (Switzerland)
    Search for more papers by this author
  • Dr. Robert N. Grass

    Corresponding author
    1. Department of Chemistry and Applied Biosciences, ETH Zurich, Wolfgang-Pauli-Strasse 10, 8093 Zurich (Switzerland)
    • Department of Chemistry and Applied Biosciences, ETH Zurich, Wolfgang-Pauli-Strasse 10, 8093 Zurich (Switzerland)
    Search for more papers by this author

  • We thank ICB/ETH Zurich for financial support, P. Stössel for photography, and Prof. W. J. Stark for helpful discussions.

Abstract

original image

Tough to remove this label! When protected within a silica sphere, DNA can withstand high temperatures (up to 200 °C) and aggressive radical conditions. Following deprotection with HF, the DNA can be analyzed by standard biochemical methods. This DNA protection/deprotection scheme is compatible with standard polymer processing and can be used for labeling material of nonbiological origin.

Ancillary