We thank ICB/ETH Zurich for financial support, P. Stössel for photography, and Prof. W. J. Stark for helpful discussions.
Protection and Deprotection of DNA—High-Temperature Stability of Nucleic Acid Barcodes for Polymer Labeling†
Article first published online: 6 MAR 2013
Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Angewandte Chemie International Edition
Volume 52, Issue 15, pages 4269–4272, April 8, 2013
How to Cite
Paunescu, D., Fuhrer, R. and Grass, R. N. (2013), Protection and Deprotection of DNA—High-Temperature Stability of Nucleic Acid Barcodes for Polymer Labeling . Angew. Chem. Int. Ed., 52: 4269–4272. doi: 10.1002/anie.201208135
- Issue published online: 3 APR 2013
- Article first published online: 6 MAR 2013
- Manuscript Received: 9 OCT 2012
- ICB/ETH Zurich
- polymerase chain reaction;
- sol–gel processes
Tough to remove this label! When protected within a silica sphere, DNA can withstand high temperatures (up to 200 °C) and aggressive radical conditions. Following deprotection with HF, the DNA can be analyzed by standard biochemical methods. This DNA protection/deprotection scheme is compatible with standard polymer processing and can be used for labeling material of nonbiological origin.