This research was supported by a Korea CCS R&D Center (KCRC) grant funded by the Korean government (Ministry of Education, Science, and Technology; No. 2011-0032167). SEM and XRD analysis was conducted at the Korea University Engineering Laboratory Center, and TEM analysis was carried out at the Korea Basic Science Institute (KBSi). Si-CHA zeolites are all-silica chabazite-type zeolites.
Uniform Si-CHA Zeolite Layers Formed by a Selective Sonication-Assisted Deposition Method†
Article first published online: 10 APR 2013
Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Angewandte Chemie International Edition
Volume 52, Issue 20, pages 5280–5284, May 10, 2013
How to Cite
Kim, E., Cai, W., Baik, H. and Choi, J. (2013), Uniform Si-CHA Zeolite Layers Formed by a Selective Sonication-Assisted Deposition Method . Angew. Chem. Int. Ed., 52: 5280–5284. doi: 10.1002/anie.201301265
- Issue published online: 3 MAY 2013
- Article first published online: 10 APR 2013
- Manuscript Received: 13 FEB 2013
- Korean government
- Ministry of Education, Science, and Technology. Grant Number: 2011-0032167
- uniform layers;
- X-ray diffraction;
Discrimination against the majority: The broad size distribution of conventional near-cubic Si-CHA (all-silica chabazite) zeolites impedes the formation of a close-packed layer, which is critical for the manufacture of zeolite films by secondary growth. Although present in lower abundance, platelike Si-CHA particles cosynthesized with near-cubic particles were deposited selectively on an α-Al2O3 disk to form a uniform layer.