Patternable Large-Scale Molybdenium Disulfide Atomic Layers Grown by Gold-Assisted Chemical Vapor Deposition

Authors

  • Intek Song,

    1. Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), 77 Cheongam-Ro, Nam-Gu, Pohang, 790-784 (Korea)
    2. Department of Chemistry, Pohang University of Science and Technology (POSTECH), 77 Cheongam-Ro, Nam-Gu, Pohang, 790-784 (Korea) http://www.postech.ac.kr/chem/nmrl
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  • Chibeom Park,

    1. Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), 77 Cheongam-Ro, Nam-Gu, Pohang, 790-784 (Korea)
    2. Department of Chemistry, Pohang University of Science and Technology (POSTECH), 77 Cheongam-Ro, Nam-Gu, Pohang, 790-784 (Korea) http://www.postech.ac.kr/chem/nmrl
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  • Misun Hong,

    1. Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), 77 Cheongam-Ro, Nam-Gu, Pohang, 790-784 (Korea)
    2. Department of Chemistry, Pohang University of Science and Technology (POSTECH), 77 Cheongam-Ro, Nam-Gu, Pohang, 790-784 (Korea) http://www.postech.ac.kr/chem/nmrl
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  • Jaeyoon Baik,

    1. Pohang Accelerator Laboratory and Department of Physics, Pohang University of Science and Technology (POSTECH), 77 Cheongam-Ro, Nam-Gu, Pohang, 790-784 (Korea)
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  • Hyun-Joon Shin,

    1. Pohang Accelerator Laboratory and Department of Physics, Pohang University of Science and Technology (POSTECH), 77 Cheongam-Ro, Nam-Gu, Pohang, 790-784 (Korea)
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  • Hee Cheul Choi

    Corresponding author
    1. Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), 77 Cheongam-Ro, Nam-Gu, Pohang, 790-784 (Korea)
    2. Department of Chemistry, Pohang University of Science and Technology (POSTECH), 77 Cheongam-Ro, Nam-Gu, Pohang, 790-784 (Korea) http://www.postech.ac.kr/chem/nmrl
    • Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), 77 Cheongam-Ro, Nam-Gu, Pohang, 790-784 (Korea)

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  • This work was partially supported by the National Research Foundation of Korea (NRF) grant (2010-00285, 2012R1A2A1A01003040, and 2009-0094036). I. Song is grateful to Global Ph.D. Fellowship grant from NRF (2012H1A2A1016525). We thank Pohang Accelerator Laboratory (Beamline 8A1).

Abstract

A novel way to grow MoS2 on a large scale with uniformity and in desired patterns is developed. We use Au film as a catalyst on which [Mo(CO)6] vapor decomposes to form a Mo-Au surface alloy that is an ideal Mo reservoir for the growth of atomic layers of MoS2. Upon exposure to H2S, this surface alloy transforms into a few layers of MoS2, which can be isolated and transferred on an arbitrary substrate. By simply patterning Au catalyst film by conventional lithographic techniques, MoS2 atomic layers in desired patterns can be fabricated.

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