We thank Dr. Bill Flounders and Dr. Sia Parsa from the UC Berkeley Marvell Nanofabrication Laboratory for helpful discussions and the use of photomasks. We are grateful to Miguel Gonzalez and Dr. Alan Yiu for assistance with photography, optical microscopy, and profilometry measurements. Nick Kornienko is acknowledged for assistance with electron microscopy and EDX analysis. R.A. thanks the Research Foundation Flanders (FWO Vlaanderen) for a postdoctoral fellowship.
Lithographic Deposition of Patterned Metal–Organic Framework Coatings Using a Photobase Generator†
Article first published online: 9 APR 2014
© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Angewandte Chemie International Edition
Volume 53, Issue 22, pages 5561–5565, May 26, 2014
How to Cite
Keitz, B. K., Yu, C. J., Long, J. R. and Ameloot, R. (2014), Lithographic Deposition of Patterned Metal–Organic Framework Coatings Using a Photobase Generator. Angew. Chem. Int. Ed., 53: 5561–5565. doi: 10.1002/anie.201400580
- Issue published online: 25 MAY 2014
- Article first published online: 9 APR 2014
- Manuscript Received: 19 JAN 2014
- metal–organic frameworks;
- thin films
A photobase generator was used to induce metal–organic framework (MOF) nucleation upon UV irradiation. This method was further developed into a simple, one-step method for depositing patterned MOF films. Furthermore, the ability of our method to coat a single substrate with MOF films having different chemical compositions is illustrated. The method is an important step towards integrating MOF deposition with existing lithographic techniques and the incorporation of these materials into sensors and other electronic devices.