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Lithographic Deposition of Patterned Metal–Organic Framework Coatings Using a Photobase Generator

Authors

  • Dr. Benjamin K. Keitz,

    1. Department of Chemistry, University of California, Berkeley, Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (USA)
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  • Chung Jui Yu,

    1. Department of Chemistry, University of California, Berkeley, Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (USA)
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  • Prof. Jeffrey R. Long,

    1. Department of Chemistry, University of California, Berkeley, Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (USA)
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  • Dr. Rob Ameloot

    Corresponding author
    1. Department of Chemistry, University of California, Berkeley, Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (USA)
    • Department of Chemistry, University of California, Berkeley, Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (USA)===

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  • We thank Dr. Bill Flounders and Dr. Sia Parsa from the UC Berkeley Marvell Nanofabrication Laboratory for helpful discussions and the use of photomasks. We are grateful to Miguel Gonzalez and Dr. Alan Yiu for assistance with photography, optical microscopy, and profilometry measurements. Nick Kornienko is acknowledged for assistance with electron microscopy and EDX analysis. R.A. thanks the Research Foundation Flanders (FWO Vlaanderen) for a postdoctoral fellowship.

Abstract

A photobase generator was used to induce metal–organic framework (MOF) nucleation upon UV irradiation. This method was further developed into a simple, one-step method for depositing patterned MOF films. Furthermore, the ability of our method to coat a single substrate with MOF films having different chemical compositions is illustrated. The method is an important step towards integrating MOF deposition with existing lithographic techniques and the incorporation of these materials into sensors and other electronic devices.

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