Deposition of osmium and ruthenium thin films from organometallic cluster precursors
Article first published online: 8 APR 2009
Copyright © 2009 John Wiley & Sons, Ltd.
Applied Organometallic Chemistry
Volume 23, Issue 5, pages 196–199, May 2009
How to Cite
Li, C., Leong, W. K. and Loh, K. P. (2009), Deposition of osmium and ruthenium thin films from organometallic cluster precursors. Appl. Organometal. Chem., 23: 196–199. doi: 10.1002/aoc.1494
- Issue published online: 8 APR 2009
- Article first published online: 8 APR 2009
- Manuscript Accepted: 28 FEB 2009
- Manuscript Revised: 23 FEB 2009
- Manuscript Received: 29 JAN 2009
- A*STAR. Grant Number: 022 109 0061
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