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Studies on plasma polymerization of hexamethyldisiloxane in the presence of different carrier gases

Authors

  • Jianglin Fang,

    1. Center of Materials Analysis, Nanjing University, Nanjing 210093, People's Republic of China
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  • Hong Chen,

    1. Department of Polymer Science and Engineering, Nanjing University, Nanjing 210093, People's Republic of China
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  • Xuehai Yu

    Corresponding author
    1. Department of Polymer Science and Engineering, Nanjing University, Nanjing 210093, People's Republic of China
    • Department of Polymer Science and Engineering, Nanjing University, Nanjing 210093, People's Republic of China
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Abstract

Plasma polymerization of hexamethyldisiloxane(HMDSO) in the presence of different carrier gases such as H2, He, N2, Ar, and O2 was carried out using an inductively coupled electrodeless glow discharge. The polymerization kinetics showed that the monomer HMDSO plasma-polymerized at different rates from low to high for the carrier gases H2, He, N2, Ar, and O2 in that order. The products were studied using FTIR, electron spectroscopy for chemical analysis, and elemental analysis. The results indicated that HMDSO molecules underwent different degrees of fragmentation in plasma polymerization for different carrier gases and radio frequency (RF) powers. The polymer deposition rate and the structures of products were mainly dependent on molecular fragmentation, which varied with carrier gas and imposed RF power. O2 and H2 gases can incorporate in the plasma polymers to form products containing more oxygen or hydrogen components, while other gases such as N2 have no detectable component in products. © 2001 John Wiley & Sons, Inc. J Appl Polym Sci 80: 1434–1438, 2001

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