Design and synthesis of new photoresist materials for ArF lithography
Article first published online: 27 JAN 2004
Copyright © 2004 Wiley Periodicals, Inc.
Journal of Applied Polymer Science
Volume 92, Issue 1, pages 165–170, 5 April 2004
How to Cite
Seo, H.-U., Jin, S.-H., Choi, S.-J., Gal, Y.-S. and Lim, K. T. (2004), Design and synthesis of new photoresist materials for ArF lithography. J. Appl. Polym. Sci., 92: 165–170. doi: 10.1002/app.13701
- Issue published online: 27 JAN 2004
- Article first published online: 27 JAN 2004
- Manuscript Accepted: 29 AUG 2003
- Manuscript Received: 30 DEC 2002
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