The mechanism of photoprotection of polystyrene film by some ultraviolet absorbers
Article first published online: 9 MAR 2003
Copyright © 1974 John Wiley & Sons, Inc.
Journal of Applied Polymer Science
Volume 18, Issue 1, pages 117–124, January 1974
How to Cite
George, G. A. (1974), The mechanism of photoprotection of polystyrene film by some ultraviolet absorbers. J. Appl. Polym. Sci., 18: 117–124. doi: 10.1002/app.1974.070180110
- Issue published online: 9 MAR 2003
- Article first published online: 9 MAR 2003
- Manuscript Revised: 5 JUN 1973
- Manuscript Received: 6 APR 1973
The efficiency of three commercial ultraviolet absorbers, a 2-hydroxy benzophenone, a 2-hydroxy benzotriazole, and a nickel chelate, in preventing the photo-oxidation of polystyrene films has been measured. When compared with the calculated screening and phosphorescence quenching efficiency, it is found that (i) the nickel chelate protects the substrate by UV screening alone and is a poor photoprotector, and (ii) the 2-hydroxy benzophenone and 2-hydroxy benzotriazole are more efficient photoprotectors and protect by triplet energy transfer from excited polymer carbonyl impurity groups in addition to UV screening.