On leave at NASA–Ames Research Center as a National Research Council Associate.
A study of the contact angle on RTV-silicone treated in a hydrogen glow discharge
Version of Record online: 9 MAR 2003
Copyright © 1975 John Wiley & Sons, Inc.
Journal of Applied Polymer Science
Volume 19, Issue 2, pages 451–459, February 1975
How to Cite
Hudis, M. and Prescott, L. E. (1975), A study of the contact angle on RTV-silicone treated in a hydrogen glow discharge. J. Appl. Polym. Sci., 19: 451–459. doi: 10.1002/app.1975.070190211
- Issue online: 9 MAR 2003
- Version of Record online: 9 MAR 2003
- Manuscript Revised: 5 AUG 1974
- Manuscript Received: 4 JUN 1974
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