A method of making thin polymer (polystyrene and polysiloxane) films by glow discharge is described. The thickness of the films varies between several hundred angstroms and a few microns. The parameters of the method are studied: pressure, frequency, current density in the discharge and discharge time. An interpretation of the physical phenomena is given, and we show that it applies qualitatively to the two polymers studied. An infrared spectrometric analysis of the product obtained shows that it differs little from the product obtained by chemical means and that, for polysiloxane, the most probable configuration is that of a linear polymer. Thermostability is studied, and we show that the polymer does not suffer any serious damage up to temperatures of 400°C applied for about 10 hr. The possibility of obtaining films of several thousand angstroms and with adequate temperature stability make it possible to use polymers in the insulation and the passivation of semiconductor components.