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Synthesis and evaluation of methyl methacrylate copolymers and terpolymers as electron-beam resists. I. Poly(methyl methacrylate–methacrylic acid–methacryloyl chloride)


  • Presented at the Second International Conference on Electron Beam Technologies, Varna-1988, Bulgaria.


Terpolymers of methyl methacrylate with methacrylic acid and methacryloyl chloride [poly(MMA-MAA-MAC)] were synthesized with high yields by slow radical polymerization. The influence of the temperature of prebaking on the changes in the chemical composition and the molecular weight characteristics of poly(MMA-5%MAA-5%MAC) was studied by infrared spectroscopy and gel permeation chromatography. It was found that resists containing terpolymer with molecular weight (M̄w) of 41,000, which were prebaked at 100°C, were able to produce high contrast images (γ = 3.3) at doses of 16 μC/cm2.

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