Part II: See Ref. 11.
Preparation and properties of Si-containing copolymer for near-UV resist. III. Maleimide/silylstyrene copolymer†
Article first published online: 10 MAR 2003
Copyright © 1993 John Wiley & Sons, Inc.
Journal of Applied Polymer Science
Volume 49, Issue 5, pages 893–899, 5 August 1993
How to Cite
Chiang, W.-Y. and Lu, J.-Y. (1993), Preparation and properties of Si-containing copolymer for near-UV resist. III. Maleimide/silylstyrene copolymer. J. Appl. Polym. Sci., 49: 893–899. doi: 10.1002/app.1993.070490515
- Issue published online: 10 MAR 2003
- Article first published online: 10 MAR 2003
- Manuscript Accepted: 13 NOV 1992
- Manuscript Received: 24 JUN 1992
Poly(maleimide-alt-p-trimethylsilyl-α-methylstyrene) (α-PMTMMS) and poly(male-imide-alt-p-trimethylsilylstyrene) (PMTMSS) were synthesized for positive/negative near-UV resists in the containing of diazonaphthoquinone sulfonate (DNS). The electron-rich styrenic monomers tend to undergo alternating copolymerization with an electron-poor maleimide monomer. The chain-stiffening effects of the maleimide and α-methylstyrene group were responsible for high thermal stabilities. A higher glass transition temperature of 226°C was found in α-PMTMMS. Lithographic positive/negative images were obtained that were stable to temperatures higher than 200°C. Excellent solubility in aqueous base was observed with PMTMSS at 10.3 wt % silicon content and an oxygen-plasma etching rate of 1:12 compared to hard-baked HPR–204. © 1993 John Wiley & Sons, Inc.