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Keywords:

  • surfaces;
  • atom-transfer radical polymerization (ATRP);
  • graft copolymers;
  • lithography;
  • nanotechnology

Abstract

Atom-transfer radical polymerization (ATRP) of benzyl methacrylate (BzMA) at ambient temperature was applied to step and flash imprint lithography. This process involved the formation of patterned polymeric networks (top-down) and the grafting polymerization of BzMA from these networks (bottom-up) via ATRP. Confocal laser scanning microscope and scanning electron microscope were used to determine the change in line-to-line separation (width) resulting from poly BzMA brush. The increase in line width at 400 nm could be maximized given a reaction time of 2 h. © 2006 Wiley Periodicals, Inc. J Appl Polym Sci 101: 1953–1957, 2006