New aqueous base developable photoresist for lithographic printing plates applications

Authors

  • A. M. El-Demerdash,

    Corresponding author
    1. Department of Materials Science, Institute of Graduate Studies and Research, Alexandria University, Shatby, Alexandria 21526, Egypt
    • Department of Materials Science, Institute of Graduate Studies and Research, Alexandria University, Shatby, Alexandria 21526, Egypt
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  • W. A. Sadik

    1. Department of Materials Science, Institute of Graduate Studies and Research, Alexandria University, Shatby, Alexandria 21526, Egypt
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Abstract

Negative photoresists are materials that become insoluble in developing solution when exposed to optical radiation. This work describes the production of simple negative-working resists, demonstrating aqueous development, for potential printing plate applications. The copolymers comprised glycidyl methacrylate (GMA) and acrylic acid (AA) via free-radical solution polymerization in methyl ethyl ketone as a solvent using azobisisobutyronitrile as initiator at 60°C. Characterization of the copolymers prepared was carried out via IR, 1H-NMR, and thermal analysis techniques. The copolymers of GMA/AA were successfully prepared over a wide range of composition. It was found that the copolymer containing 15 mol % of AA unit in the feed was developed with NaOH on copper plate rather than zinc plate and crosslinked in the presence of photogenerated acid (PAG) caused by acid-initiated ring-opening polymerization of pendant epoxide groups. Exposure of the resist films to UV radiation at λmax = 365 nm results in the generation of acid, and the subsequent baking process at 80°C for 1 min promotes the diffusion of the PAG, which initiates the cationic crosslinking of the epoxide rings. © 2010 Wiley Periodicals, Inc. J Appl Polym Sci, 2010

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