Novel sulfur—containing benzophenone derivative as radical photoinitiator for photopolymerization

Authors

  • Marek Pietrzak,

    Corresponding author
    1. Faculty of Chemical Technology and Engineering, University of Technology and Life Sciences, Seminaryjna 3, 85-326 Bydgoszcz, Poland
    • Faculty of Chemical Technology and Engineering, University of Technology and Life Sciences, Seminaryjna 3, 85-326 Bydgoszcz, Poland
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  • Andrzej Wrzyszczyński

    1. Faculty of Chemical Technology and Engineering, University of Technology and Life Sciences, Seminaryjna 3, 85-326 Bydgoszcz, Poland
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Abstract

A novel, highly efficient, polymerizable sulfur-containing photoinitiator for free radical polymerization, benzophenone thio-acetic acid (BP-S-CH2-COOH) was synthesized, characterized, and compared to photoinitiator parameters of the benzophenone (BP) and benzophenone/(phenylthio)acetic acid couple. The photoinitiator possesses a greatly redshifted UV maximal absorption in comparison to BP. Laser flash photolysis studies suggest that photoinitiator radicals are generated by photocleavage of C[BOND]S bond. Photopolymerization of 2-ethyl-2-(hydroxymethyl)-1,3-propanediol triacrylate (TMPTA) demonstrated that one-component system BP[BOND]S[BOND]CH2[BOND]COOH is more efficient for polymerization than two-component system. © 2011 Wiley Periodicals, Inc. J Appl Polym Sci, 2011

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