Positive-tone, aqueous-developable, polynorbornene dielectric: Lithographic, and dissolution properties

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Abstract

A positive-tone, aqueous base soluble, polynorbornene (PNB) dielectric formulation has been developed. The photolithographic solubility switching mechanism is based on diazonaphthoquinone (DNQ) inhibition of PNB resin functionalized with pendent fluoroalcohol and carboxylic acid substituents. The optical contrast (at 365 nm) was found to be 2.3. The maximum height-to-width aspect ratio of developed line and space features was 3 : 2. The sensitivity, D100, of a formulation containing 20 pphr of DNQ photoactive compound (PAC) was calculated to be 408 mJ cm−2. The effects of the PAC molecule structure on miscibility and dissolution of the photosensitive films in aqueous base developer were studied. The effect of the monomer composition of the PNB polymer on the dissolution rate of the formulated PNB resin was evaluated. A unique dissolution and swelling behavior was observed. The effect is attributed to a copolymer synthesized with two monomers each of which is susceptible to deprotonation in aqueous base. FTIR measurements showed that the pure PNBFA has a small percentage of free hydroxyl groups, which did not change appreciably by the addition of PAC to the mixture. © 2012 Wiley Periodicals, Inc. J. Appl. Polym. Sci., 2013

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