Further Enhancement of the Second-Order Nonlinear Optical (NLO) Coefficient and the Stability of NLO Polymers that Contain Isolation Chromophore Moieties by Using the “Suitable Isolation Group” Concept and the Ar/ArF Self-Assembly Effect
Article first published online: 25 MAR 2013
Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemistry – An Asian Journal
Special Issue: Conference Issue: 15th Asian Chemical Congress
Volume 8, Issue 8, pages 1836–1846, August 2013
How to Cite
Wu, W., Ye, C., Qin, J. and Li, Z. (2013), Further Enhancement of the Second-Order Nonlinear Optical (NLO) Coefficient and the Stability of NLO Polymers that Contain Isolation Chromophore Moieties by Using the “Suitable Isolation Group” Concept and the Ar/ArF Self-Assembly Effect. Chem. Asian J., 8: 1836–1846. doi: 10.1002/asia.201300010
- Issue published online: 26 JUL 2013
- Article first published online: 25 MAR 2013
- Manuscript Received: 4 JAN 2013
- National Science Foundation of China. Grant Number: 21034006
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