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Keywords:

  • ELF magnetic field exposure systems;
  • localized magnetic field

In extremely low frequency (ELF) magnetic field exposure systems for the inverted microscope stage where the cells grown on the entire microscope cover-slip are exposed to the magnetic field, the effects of variations in cell characteristics from one cover-slip to another on the experimental data cannot be readily identified. To overcome this drawback, a localized ELF magnetic field exposure system for cells grown on cover-slips was designed. The basic idea is to expose only a marked portion of the cover-slip to the magnetic field so that the effect of the ELF magnetic field on the cells grown on the same cover-slip can be observed under a microscope. A prototype system was built and tested. Experimental test results pertaining to the prototype system performance validate the proposed design approach. The paper concludes with a discussion of alternative approaches to the design of localized ELF magnetic field exposure systems. Bioelectromagnetics. 35:354–362, 2014. © 2014 Wiley Periodicals, Inc.