A localized ELF magnetic field exposure system for microscope cover-slips
Article first published online: 28 FEB 2014
© 2014 Wiley Periodicals, Inc.
Volume 35, Issue 5, pages 354–362, July 2014
How to Cite
Wang, P. K. C. (2014), A localized ELF magnetic field exposure system for microscope cover-slips. Bioelectromagnetics, 35: 354–362. doi: 10.1002/bem.21844
- Issue published online: 24 JUN 2014
- Article first published online: 28 FEB 2014
- Manuscript Accepted: 20 JAN 2014
- Manuscript Received: 18 MAY 2013
- UCLA Academic Senate Research
- ELF magnetic field exposure systems;
- localized magnetic field
In extremely low frequency (ELF) magnetic field exposure systems for the inverted microscope stage where the cells grown on the entire microscope cover-slip are exposed to the magnetic field, the effects of variations in cell characteristics from one cover-slip to another on the experimental data cannot be readily identified. To overcome this drawback, a localized ELF magnetic field exposure system for cells grown on cover-slips was designed. The basic idea is to expose only a marked portion of the cover-slip to the magnetic field so that the effect of the ELF magnetic field on the cells grown on the same cover-slip can be observed under a microscope. A prototype system was built and tested. Experimental test results pertaining to the prototype system performance validate the proposed design approach. The paper concludes with a discussion of alternative approaches to the design of localized ELF magnetic field exposure systems. Bioelectromagnetics. 35:354–362, 2014. © 2014 Wiley Periodicals, Inc.