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Polymer peel-off mask for high-resolution surface derivatization, neuron placement and guidance

Authors

  • Dolores Martinez,

    1. National Research Council of Canada, 1200 Montreal Road, Ottawa, Ontario K1A 0R6, Canada; telephone: 1-613-990-3598; fax: 1-613-990-0202
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  • Christophe Py,

    Corresponding author
    1. National Research Council of Canada, 1200 Montreal Road, Ottawa, Ontario K1A 0R6, Canada; telephone: 1-613-990-3598; fax: 1-613-990-0202
    • National Research Council of Canada, 1200 Montreal Road, Ottawa, Ontario K1A 0R6, Canada; telephone: 1-613-990-3598; fax: 1-613-990-0202
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  • Mike Denhoff,

    1. National Research Council of Canada, 1200 Montreal Road, Ottawa, Ontario K1A 0R6, Canada; telephone: 1-613-990-3598; fax: 1-613-990-0202
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  • Robert Monette,

    1. National Research Council of Canada, 1200 Montreal Road, Ottawa, Ontario K1A 0R6, Canada; telephone: 1-613-990-3598; fax: 1-613-990-0202
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  • Tanya Comas,

    1. National Research Council of Canada, 1200 Montreal Road, Ottawa, Ontario K1A 0R6, Canada; telephone: 1-613-990-3598; fax: 1-613-990-0202
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  • Anthony Krantis,

    1. Centre for Research in Biopharmaceuticals and Biotechnology, University of Ottawa, Ottawa, Ontario, Canada
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  • Geoffrey Mealing

    1. National Research Council of Canada, 1200 Montreal Road, Ottawa, Ontario K1A 0R6, Canada; telephone: 1-613-990-3598; fax: 1-613-990-0202
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Abstract

We present a dry lift-off method using a chemically resistant spin-on plastic, polyimide, to pattern surfaces with high accuracy and resolution. Using well-known lithographic and reactive ion etching techniques, the spin-on polymer is patterned over a silicon dioxide surface. The plastic efficiently adheres to the silicon dioxide surface during the chemical modification and is readily lifted-off following the derivatization process, permitting highly reliable surface derivatization. The verticality of the reactive ion etch enables sub-micrometer features to be patterned, down to 0.8 µm. The technique is used to pattern neurons on silicon dioxide surfaces: efficient neuron placement over a 4 mm area is shown for patterns larger than 50 µm while process guidance is shown for 10 µm patterns. Biotechnol. Bioeng. 2013; 110: 2236–2241. © 2013 Wiley Periodicals, Inc.

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