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Copper(I)-Containing Ionic Liquids for High-Rate Electrodeposition

Authors

  • Dr. Neil R. Brooks,

    Corresponding author
    1. Katholieke Universiteit Leuven, Department of Chemistry, Celestijnenlaan 200F, P.O. Box 2404, 3001 Heverlee (Belgium), Fax: (+32) 16327992
    • Katholieke Universiteit Leuven, Department of Chemistry, Celestijnenlaan 200F, P.O. Box 2404, 3001 Heverlee (Belgium), Fax: (+32) 16327992
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  • Stijn Schaltin,

    1. Katholieke Universiteit Leuven, Department of Metallurgy and Materials Engineering (MTM), Kasteelpark Arenberg 44 - P.O. Box 2450, 3001 Heverlee (Belgium)
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  • Dr. Kristof Van Hecke,

    1. Katholieke Universiteit Leuven, Department of Chemistry, Celestijnenlaan 200F, P.O. Box 2404, 3001 Heverlee (Belgium), Fax: (+32) 16327992
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  • Prof. Luc Van Meervelt,

    1. Katholieke Universiteit Leuven, Department of Chemistry, Celestijnenlaan 200F, P.O. Box 2404, 3001 Heverlee (Belgium), Fax: (+32) 16327992
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  • Prof. Koen Binnemans,

    1. Katholieke Universiteit Leuven, Department of Chemistry, Celestijnenlaan 200F, P.O. Box 2404, 3001 Heverlee (Belgium), Fax: (+32) 16327992
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  • Prof. Jan Fransaer

    1. Katholieke Universiteit Leuven, Department of Metallurgy and Materials Engineering (MTM), Kasteelpark Arenberg 44 - P.O. Box 2450, 3001 Heverlee (Belgium)
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Abstract

New metal-containing ionic liquids [Cu(CH3CN)n][Tf2N] (n=2, 4; Tf2N=bis(trifluoromethylsulfonyl)- amide) have been synthesised and used as a non-aqueous electrolyte for the electrodeposition of copper at current densities greater than 25 A dm−2. The tetrahedral copper(I)-containing cation in [Cu(CH3CN)4][Tf2N] is structurally analogous to quaternary ammonium and phosphonium ionic liquids and overcomes problems of metal solubility and mass transport. Two CH3CN ligands are removed at elevated temperatures to give [Cu(CH3CN)2][Tf2N], which can be used as a concentrated non-aqueous electrolyte. The structural and electrochemical characterisation of these compounds is described herein.

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