Cover Picture: Reduction of NO by CO on Unsupported Ir: Bridging the Materials Gap (ChemPhysChem 12/2010)

Authors

  • Wenhua Chen Dr.,

    1. Department of Physics and Astronomy and Laboratory for Surface Modification, Rutgers, The State University of New Jersey, Piscataway, New Jersey 08854 (USA), Fax: (+01) 732-445-4991
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  • Quantong Shen Dr.,

    1. Department of Physics and Astronomy and Laboratory for Surface Modification, Rutgers, The State University of New Jersey, Piscataway, New Jersey 08854 (USA), Fax: (+01) 732-445-4991
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  • Robert A. Bartynski Prof. Dr.,

    1. Department of Physics and Astronomy and Laboratory for Surface Modification, Rutgers, The State University of New Jersey, Piscataway, New Jersey 08854 (USA), Fax: (+01) 732-445-4991
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  • Payam Kaghazchi Dr.,

    1. Institut für Elektrochemie, Universität Ulm, Albert-Einstein-Allee 47, 89069 Ulm (Germany)
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  • Timo Jacob Dr.

    1. Institut für Elektrochemie, Universität Ulm, Albert-Einstein-Allee 47, 89069 Ulm (Germany)
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Abstract

original image

Surface faceting is used to prepare a nanoscale model Ir catalyst. The cover picture illustrates a schematic of the faceting process on Ir(210) and single three-sided pyramid on faceted Ir(210) exposing (311), (31equation image) and (110) facets. Clean planar Ir(210) and clean faceted Ir(210) are then used to study reduction of NO by CO as described on p. 2515 by W. Chen et al.

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