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Cycloaddition Functionalization of Cleaved Microstructures

Authors

  • Dr. Emanuela Carleschi,

    1. IOM-CNR TASC Laboratory, Basovizza S.S. 14 Km 163.5, 34149 Trieste (Italy), Fax: (+39) 040 226767
    2. Department of Physics, University of Johannesburg, Corner Kingsway and University Road, Auckland Park, 2006, Johannesburg (South Africa)
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  • Dr. Elena Magnano,

    1. IOM-CNR TASC Laboratory, Basovizza S.S. 14 Km 163.5, 34149 Trieste (Italy), Fax: (+39) 040 226767
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  • Dr. Mauro Melli,

    1. IOM-CNR TASC Laboratory, Basovizza S.S. 14 Km 163.5, 34149 Trieste (Italy), Fax: (+39) 040 226767
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  • Dr. Marco Lazzarino

    Corresponding author
    1. IOM-CNR TASC Laboratory, Basovizza S.S. 14 Km 163.5, 34149 Trieste (Italy), Fax: (+39) 040 226767
    2. Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG, Groningen (The Netherlands)
    • IOM-CNR TASC Laboratory, Basovizza S.S. 14 Km 163.5, 34149 Trieste (Italy), Fax: (+39) 040 226767
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Abstract

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Where you want it, when you want it: When cleaved in vacuum, a semiconductor exposes a highly reactive surface that can be exploited to obtain well controlled chemical bonds. Now, using sacrificial microstructures and a 2+2 cycloaddition process, organic molecules are covalently bound to a silicon pre-patterned surface in liquid environment with accurate spatial control (see picture).

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