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Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments

Authors

  • Dr. Ali Dabirian ,

    Corresponding author
    1. Ecole Polytechnique Federale de Lausanne (EPFL), 1015 Lausanne (Switzerland)
    2. Delft University of Technology, Julianalaan 136, 2628 BL, Delft (The Netherlands)
    • Ecole Polytechnique Federale de Lausanne (EPFL), 1015 Lausanne (Switzerland)
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  • Dr. Yury Kuzminykh,

    1. Empa, Swiss Federal Laboratories for Materials, Science and Technology, Advanced Materials Processing, Feuerwerkerstrasse 39, CH-3602 Thun and Ecole Polytechnique Federale de Lausanne (EPFL), 1015 Lausanne (Switzerland)
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  • Dr. Estelle Wagner,

    1. 3D-Oxide, 70 rue Gustave Eiffel, Pouilly, 01630 (France)
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  • Dr. Giacomo Benvenuti,

    1. 3D-Oxide, 70 rue Gustave Eiffel, Pouilly, 01630 (France)
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  • Simon A. Rushworth,

    1. SAFC Hitech Limited, Bromborough, Wirral, CH62 3QF (UK)
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  • Prof. Patrik Hoffmann

    Corresponding author
    1. Empa, Swiss Federal Laboratories for Materials, Science and Technology, Advanced Materials Processing, Feuerwerkerstrasse 39, CH-3602 Thun and Ecole Polytechnique Federale de Lausanne (EPFL), 1015 Lausanne (Switzerland)
    • Empa, Swiss Federal Laboratories for Materials, Science and Technology, Advanced Materials Processing, Feuerwerkerstrasse 39, CH-3602 Thun and Ecole Polytechnique Federale de Lausanne (EPFL), 1015 Lausanne (Switzerland)
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Abstract

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Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and desorption-limited conditions appear to be the ideal environment for spatially addressable combinatorial experiments (see picture).

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