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Keywords:

  • antireflection;
  • chemical etching;
  • nanostructures;
  • refraction index;
  • silicon
Thumbnail image of graphical abstract

Combined nanostructure arrays with tailored structural profiles are presented (see picture, GN: graded nanostructure). These arrays exhibit a sharp decrease in reflectivity when submitted to strong sunlight irradiation, showing great potential for diverse applications, such as optical and electro-optical devices and other antireflection designs.