Tailoring Broadband Antireflection on a Silicon Surface through Two-Step Silver-Assisted Chemical Etching

Authors

  • Dr. Chia-Yun Chen,

    Corresponding author
    1. Material and Chemical Research Laboratories, Industrial Technology Research Institute, Rm. 834, Bldg. 52, 8F, 195, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu (Taiwan), Fax: (886) 3-5820207
    • Material and Chemical Research Laboratories, Industrial Technology Research Institute, Rm. 834, Bldg. 52, 8F, 195, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu (Taiwan), Fax: (886) 3-5820207
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  • Dr. Wen-Jin Li,

    1. Material and Chemical Research Laboratories, Industrial Technology Research Institute, Rm. 834, Bldg. 52, 8F, 195, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu (Taiwan), Fax: (886) 3-5820207
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  • Dr. Hsin-Hwa Chen

    1. Material and Chemical Research Laboratories, Industrial Technology Research Institute, Rm. 834, Bldg. 52, 8F, 195, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu (Taiwan), Fax: (886) 3-5820207
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Abstract

original image

Combined nanostructure arrays with tailored structural profiles are presented (see picture, GN: graded nanostructure). These arrays exhibit a sharp decrease in reflectivity when submitted to strong sunlight irradiation, showing great potential for diverse applications, such as optical and electro-optical devices and other antireflection designs.

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