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Keywords:

  • lithography;
  • polymerization;
  • resolution;
  • sub-diffraction;
  • triplet state
Thumbnail image of graphical abstract

Selective inhibition of the polymerization leads to sub-diffraction feature sizes in direct writing lithography—a principle based on the idea of stimulated emission depletion (STED) microscopy. However, the detailed understanding of the inhibition process is a key point to further enhance the resolution of the system. The authors present experiments focused on the time dynamics of the inhibition process, clarifying possible photophysical pathways.