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  • Open Access

Photopolymerization Inhibition Dynamics for Sub-Diffraction Direct Laser Writing Lithography

Authors

  • Dr. Benjamin Harke,

    Corresponding author
    1. Department of Nanophysics, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova (Italy), Fax: (+39) 010-71-781-762
    • Department of Nanophysics, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova (Italy), Fax: (+39) 010-71-781-762
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  • Dr. Paolo Bianchini,

    1. Department of Nanophysics, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova (Italy), Fax: (+39) 010-71-781-762
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  • Dr. Fernando Brandi,

    1. Department of Nanophysics, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova (Italy), Fax: (+39) 010-71-781-762
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  • Prof. Alberto Diaspro

    1. Department of Nanophysics, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova (Italy), Fax: (+39) 010-71-781-762
    2. Department of Physics, University of Genova, 16146 Genova (Italy)
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Abstract

original image

Selective inhibition of the polymerization leads to sub-diffraction feature sizes in direct writing lithography—a principle based on the idea of stimulated emission depletion (STED) microscopy. However, the detailed understanding of the inhibition process is a key point to further enhance the resolution of the system. The authors present experiments focused on the time dynamics of the inhibition process, clarifying possible photophysical pathways.

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