Thin-Film Composite Materials as a Dielectric Layer for Flexible Metal–Insulator–Metal Capacitors

Authors

  • Dr. Jitendra N. Tiwari,

    1. Institute of Nanotechnology, Department of Materials Science and Engineering, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu, 30050, R.O.C. (Taiwan), Fax: (+886) 3-5744689
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  • Jagan Singh Meena,

    1. Institute of Nanotechnology, Department of Materials Science and Engineering, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu, 30050, R.O.C. (Taiwan), Fax: (+886) 3-5744689
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  • Chung-Shu Wu,

    1. Institute of Nanotechnology, Department of Materials Science and Engineering, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu, 30050, R.O.C. (Taiwan), Fax: (+886) 3-5744689
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  • Rajanish N. Tiwari,

    1. Institute of Nanotechnology, Department of Materials Science and Engineering, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu, 30050, R.O.C. (Taiwan), Fax: (+886) 3-5744689
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  • Min-Ching Chu,

    1. Institute of Nanotechnology, Department of Materials Science and Engineering, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu, 30050, R.O.C. (Taiwan), Fax: (+886) 3-5744689
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  • Prof. Feng-Chih Chang,

    1. Institute of Nanotechnology, Department of Materials Science and Engineering, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu, 30050, R.O.C. (Taiwan), Fax: (+886) 3-5744689
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  • Prof. Fu-Hsiang Ko

    1. Institute of Nanotechnology, Department of Materials Science and Engineering, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu, 30050, R.O.C. (Taiwan), Fax: (+886) 3-5744689
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Abstract

A new organic–organic nanoscale composite thin-film (NCTF) dielectric has been synthesized by solution deposition of 1-bromoadamantane and triblock copolymer (Pluronic P123, BASF, EO20-PO70-EO20), in which the precursor solution has been achieved with organic additives. We have used a sol-gel process to make a metal–insulator–metal capacitor (MIM) comprising a nanoscale (10 nm-thick) thin-film on a flexible polyimide (PI) substrate at room temperature. Scanning electron microscope and atomic force microscope revealed that the deposited NCTFs were crack-free, uniform, highly resistant to moisture absorption, and well adhered on the Au–Cr/PI. The electrical properties of 1-bromoadamantane-P123 NCTF were characterized by dielectric constant, capacitance, and leakage current measurements. The 1-bromoadamantane-P123 NCTF on the PI substrate showed a low leakage current density of 5.5×10−11 A cm−2 and good capacitance of 2.4 fF at 1 MHz. In addition, the calculated dielectric constant of 1-bromoadamantane-P123 NCTF was 1.9, making them suitable candidates for use in future flexible electronic devices as a stable intermetal dielectric. The electrical insulating properties of 1-bromoadamantane-P123 NCTF have been improved due to the optimized dipole moments of the van der Waals interactions.

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