Communication

Efficient Water Splitting via a Heteroepitaxial BiVO4 Photoelectrode Decorated with Co-Pi Catalysts

  1. Min Zhou,
  2. Jian Bao,
  3. Wentuan Bi,
  4. Yongquan Zeng,
  5. Rui Zhu,
  6. Minshan Tao,
  7. Prof. Yi Xie*

Article first published online: 30 JUL 2012

DOI: 10.1002/cssc.201200287

Issue

ChemSusChem

ChemSusChem

Volume 5, Issue 8, pages 1420–1425, August 2012

Additional Information

How to Cite

Zhou, M., Bao, J., Bi, W., Zeng, Y., Zhu, R., Tao, M. and Xie, Y. (2012), Efficient Water Splitting via a Heteroepitaxial BiVO4 Photoelectrode Decorated with Co-Pi Catalysts. ChemSusChem, 5: 1420–1425. doi: 10.1002/cssc.201200287

Author Information

  1. Division of Nanomaterials and Nanochemistry, Hefei National Laboratory for Physical Sciences at Microscale, University of Science and Technology of China, Hefei 230026 (PR China), Fax: (+86) 551-3606266

*Division of Nanomaterials and Nanochemistry, Hefei National Laboratory for Physical Sciences at Microscale, University of Science and Technology of China, Hefei 230026 (PR China), Fax: (+86) 551-3606266

Publication History

  1. Issue published online: 7 AUG 2012
  2. Article first published online: 30 JUL 2012
  3. Manuscript Revised: 23 MAY 2012
  4. Manuscript Received: 24 APR 2012

Funded by

  • National Basic Research Program of China. Grant Number: 2009CB939901
  • National Natural Science Foundation of China. Grant Numbers: 11079004, 90922016, 10979047
  • Chinese Academy of Science. Grant Number: KJCXZ-YW-H2O

SEARCH

SEARCH BY CITATION

ARTICLE TOOLS

View Full Article with Supporting Information (HTML) Get PDF (1401K)

Keywords:

  • charge transfer;
  • cobalt;
  • surface modification;
  • vanadates;
  • water splitting
Thumbnail image of graphical abstract

Co-Pi cat: The surface of a BiVO4 film obtained by heteroepitaxy, displaying a morphology akin to interconnected walls, is decorated with Co-Pi catalysts in order to obtain an efficient water-splitting catalyst. Qualitative analysis confirms an increased efficiency of photon use, attributable to the suppression of both bulk and surface recombination owing to the combined effects of heteroepitaxy and surface modification, respectively.

View Full Article with Supporting Information (HTML) Get PDF (1401K)