Atomic Layer Deposition of High Performance Ultrathin TiO2 Blocking Layers for Dye-Sensitized Solar Cells



Invited for this month′s cover is the group of Gregory Parsons at North Carolina State University. The image shows one cycle of TiO2 atomic layer deposition (ALD), in which the sequential dosing and purging of TiCl4 and H2O forms ultrathin and conformal TiO2 films on rough FTO glass. Pinhole-free ALD TiO2 forms a blocking layer to impede electron–hole recombination at the FTO/electrolyte interface in dye-sensitized solar cells. The ALD process allows discrete tuning of the blocking-layer thickness to maximize performance improvement. Read the full text of the article at 10.1002/cssc.201300067