Cover Picture: Atomic Layer Deposition of High Performance Ultrathin TiO2 Blocking Layers for Dye-Sensitized Solar Cells (ChemSusChem 6/2013)

Authors

  • Do Han Kim,

    1. Chemical and Biomolecular Engineering, North Carolina State University, 911 Partners Way, Engineering Building I, Raleigh, NC, 27695 (USA), Fax: (+1) 919-515-3465
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  • Mariah Woodroof,

    1. Chemical and Biomolecular Engineering, University of Delaware, 150 Academy Street, Colburn Laboratory, Newark, DE, 19716 (USA)
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  • Kyoungmi Lee,

    1. Chemical and Biomolecular Engineering, North Carolina State University, 911 Partners Way, Engineering Building I, Raleigh, NC, 27695 (USA), Fax: (+1) 919-515-3465
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  • Prof. Gregory N. Parsons

    Corresponding author
    1. Chemical and Biomolecular Engineering, North Carolina State University, 911 Partners Way, Engineering Building I, Raleigh, NC, 27695 (USA), Fax: (+1) 919-515-3465
    • Chemical and Biomolecular Engineering, North Carolina State University, 911 Partners Way, Engineering Building I, Raleigh, NC, 27695 (USA), Fax: (+1) 919-515-3465
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Abstract

original image

The Cover Image shows the sequential dosing and purging of TiCl4 and H2O in atomic layer deposition (ALD) through step-like pressure changes in an effort to saturate the surface of fluorine doped tin oxide (FTO) glass with each reactant. These ultra-thin and uniform ALD TiO2 films with thicknesses of only 5 nm form a blocking layer on the rough FTO surface to be used in dye-sensitized solar cells (see the report by Kim et al. on page 1014) as the yallow photogenerated electrons to move to the FTO side effectively, thus inhibiting the recombination with holes at the FTO/electrolyte interface.

Cartoon 1.

Ancillary

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