• Plasma sheath;
  • particle trapping;
  • vertical wall;
  • particle diagnostics


The behavior of microparticles trapped in the curved plasma sheath in the corner of a horizontal rf electrode and a vertical wall is investigated by experiments and simulation. Three types of walls are studied, namely a dielectric wall, a floating conductive wall, and a conductive wall at the same potential as the rf electrode. The particle's equilibrium position provides insight in the acting forces, associated potentials and field structures. Complementary particle-in-cell simulations elucidate the structure of the charged-species densities and electric potential profile throughout the sheath. Thereby special emphasis is placed on how the sheath structure in the corner depends on the wall material (© 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)