Cover Picture: Contrib. Plasma Phys. 10/2012


Abstract

Line integrated electron density fluctuations in dependence on rf power and time for process pressure of 60 Pa. The mean line integrated electron density is subtracted.

Figure 9 of the paper by C. K¨ullig et al (© 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

Ancillary