National Research Council (CNR) and Padova University are gratefully acknowledged for financial assistance. The work was financially supported by the Research Program FISR-MIUR “Nanosistemi inorganici ed ibridi per lo sviluppo e l'innovazione di celle a combustibile”.
CVD of Lanthanum Oxyfluoride-Based Thin Films from a Lanthanum β-Diketonate Diglyme Precursor†
Article first published online: 17 OCT 2005
Copyright © 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Volume 11, Issue 10, pages 426–432, October, 2005
How to Cite
Barreca, D., Gasparotto, A., Maragno, C., Tondello, E., Bontempi, E., Depero, L. E. and Sada, C. (2005), CVD of Lanthanum Oxyfluoride-Based Thin Films from a Lanthanum β-Diketonate Diglyme Precursor. Chem. Vap. Deposition, 11: 426–432. doi: 10.1002/cvde.200506412
- Issue published online: 17 OCT 2005
- Article first published online: 17 OCT 2005
- Manuscript Accepted: 1 AUG 2005
- Manuscript Received: 31 MAY 2005
- Lanthanum oxyflouride
Lanthanum oxyfluoride-based thin films were grown on SiO2 and Si(100) by CVD from La(hfa)3·diglyme (Hhfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedione; diglyme = bis(2-metoxyethyl)ether), acting as the source for both lanthanum and fluorine. Film syntheses were performed in an atmosphere of nitrogen + wet oxygen, with particular attention paid to the structural and compositional evolution as a function of the deposition temperature (200–500 °C). To this aim, specimens were subjected to a multi-technique characterization by means of glancing incidence X-ray diffraction (GIXRD), X-ray photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS), and atomic force microscopy (AFM). The formation of nanophasic (crystallite size < 30 nm) films containing LaOF, with a cleaner precursor conversion at the highest deposition temperatures, is evidenced and discussed, highlighting the most critical parameters for obtaining lanthanum oxyfluoride coatings with controlled properties.