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Keywords:

  • Nanocomposites;
  • Nanodiamond;
  • RF-PECVD;
  • Synthesis

Full Paper: Nanodiamond and carbon nanotube–diamond nanocomposite films were synthesized on silicon substrates, discharging hydrogen based gas mixture, using radio frequency plasma enhanced chemical vapor deposition (RF-PECVD). Prior to deposition, the silicon substrate was treated using M(NO3)3/Mg(NO3)2.6H2O (M=Co, Fe, Ni). The growth mechanisms for ND and CNTD nanocomposite were discussed.

Abstract

Nanodiamond (ND) and carbon nanotube-diamond (CNTD) nanocomposite films are synthesized on silicon(100) substrates, discharging hydrogen-based gas mixture (methane and hydrogen), using radio frequency plasma-enhanced (RF-PE)CVD. Substrate pretreatment conditions are examined for enhancing microdiamond (MD), ND, CNTD nanocomposite, or carbon nanotube (CNT) nucleation. Well-faceted MD with a low nucleation density, on a silicon substrate, is achieved using a solution of NaOH in water to roughen the silicon substrate, while ND, CNTD nanocomposite, and CNTs are acquired using Co(NO3)2/Mg(NO3)2.6H2O or Fe(NO3)3.9H2O/Mg(NO3)2.6H2O or Ni(NO3)2.6H2O/Mg(NO3)2.6H2O solution in alcohol dripped onto the silicon substrate, which means that pretreatments have a significant influence on grain size, nucleation density, and microstructure of the obtained films. The growth mechanisms for ND and CNTD nanocomposite are discussed.