The authors thank the National Defense Science and Engineering Graduate Fellowship and Draper Laboratories UIRaD for financial support, and Dr. Ed Gleason of Analog Devices for supplying the substrates.
Thin Polymer Films with High Step Coverage in Microtrenches by Initiated CVD†
Article first published online: 6 OCT 2008
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Volume 14, Issue 9-10, pages 313–318, September/October 2008
How to Cite
Baxamusa, S. H. and Gleason, K. K. (2008), Thin Polymer Films with High Step Coverage in Microtrenches by Initiated CVD. Chem. Vap. Deposition, 14: 313–318. doi: 10.1002/cvde.200806713
- Issue published online: 6 OCT 2008
- Article first published online: 6 OCT 2008
- Manuscript Revised: 13 JUN 2008
- Manuscript Received: 27 APR 2008
- Hot filament CVD;
- Step coverage
Initiated (i)CVD is used to deposit thin films of poly(cyclohexylmethacrylate) (pCHMA) in microtrenches of depth 7 µm and widths 1-5 µm. By changing the fractional saturation of the monomer vapor, step coverage of 0.85 is achieved for the highest aspect ratio trench studied while maintaining a deposition rate of 15 nm min−1. An analytical model for determining the sticking probability of the initiating radical (CH3)3CO· is developed, and is experimentally shown to be a function of the fractional saturation of the monomer vapor. For the conditions studied, the sticking probability is in the range 1.1 × 10−2–5.0 × 10−2. These results suggest that iCVD proceeds via the reaction of a vapor-phase initiating radical with a surface-adsorbed monomer.