We thank EPSRC and SAFC Hitech for funding this work. We are also grateful to Dr. G. W. Critchlow (ISST, Loughborough University) for provision of the AES data.
MOCVD and ALD of CeO2 Thin Films using a Novel Monomeric CeIV Alkoxide Precursor†
Article first published online: 3 DEC 2009
Copyright © 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Volume 15, Issue 10-12, pages 259–261, December, 2009
How to Cite
Wrench, J. S., Black, K., Aspinall, H. C., Jones, A. C., Bacsa, J., Chalker, P. R., King, P. J., Werner, M., Davies, H. O. and Heys, P. N. (2009), MOCVD and ALD of CeO2 Thin Films using a Novel Monomeric CeIV Alkoxide Precursor. Chem. Vap. Deposition, 15: 259–261. doi: 10.1002/cvde.200904279
- Issue published online: 17 DEC 2009
- Article first published online: 3 DEC 2009
- Manuscript Revised: 9 SEP 2009
- Manuscript Received: 21 JUL 2009
- SAFC Hitech
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