Growth and Characterization of Ti-Ta-O Thin Films on Si Substrates by Liquid Injection MOCVD for High-k Applications from Modified Titanium and Tantalum Precursors

Authors

  • Anjana Devi,

    Corresponding author
    1. Inorganic Materials Chemistry, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum Universitätsstr. 150, D-44780, Bochum (Germany)
    • Inorganic Materials Chemistry, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum Universitätsstr. 150, D-44780, Bochum (Germany).
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  • Malte Hellwig,

    1. Inorganic Materials Chemistry, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum Universitätsstr. 150, D-44780, Bochum (Germany)
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  • Davide Barreca,

    1. ISTM-CNR, INSTM, Department of Chemistry, Padova University Via Marzolo 1, I-35131 Padova (Italy)
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  • Harish Parala,

    1. Inorganic Materials Chemistry, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum Universitätsstr. 150, D-44780, Bochum (Germany)
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  • Reji Thomas,

    1. Department of Physics Institute for Functional Nanomaterials, University of Puerto Rico P.O. Box 23343, San Juan, PR 00931-3343 (USA)
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  • Hans-Werner Becker,

    1. Dynamitron Tandem Laboratory, Ruhr-University Bochum Univeresitätsstr. 150, D-44780, Bochum (Germany)
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  • Ram. S. Katiyar,

    1. Department of Physics Institute for Functional Nanomaterials, University of Puerto Rico P.O. Box 23343, San Juan, PR 00931-3343 (USA)
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  • Roland A. Fischer,

    1. Inorganic Materials Chemistry, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum Universitätsstr. 150, D-44780, Bochum (Germany)
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  • Eugenio Tondello

    1. Department of Chemistry, Padova University Via Marzolo 1, I-35131 Padova (Italy)
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  • The authors are grateful to the German Science Foundation (DFG-DE-790-9-1) and Aixtron AG for supporting the project. The Research Program CARIPARO “Multi-layer optical devices based on inorganic and hybrid materials by innovative synthetic strategies” is gratefully acknowledged for financial support for the work (XPS) carried out at Padova. One of the authors (R. Thomas) acknowledges the grants from Center for Hierarchical Manufacturing (#NSF-0531171) and DoE (#DE-FG02-08ER46526)

Abstract

Titanium oxide (TiO2) and titanium-tantalum oxide (Ti-Ta-O) thin films are deposited by liquid injection (LI) metal-organic (MO) CVD using metal amide-malonate complexes, [Ti(NR2)2(dbml)2], and tantalum, [Ta(NMe2)4(dbml)] (R = Me, Et; dbml = di-tert-butylmalonato). TiO2 and Ti-Ta-O films are deposited on Si(100) in the temperature ranges 350–650 °C and 500–700 °C, respectively. The structure, morphology, and chemical composition of the films are evaluated by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), Rutherford backscattering spectroscopy (RBS), and X-ray photoelectron spectroscopy (XPS). The electrical properties of the films, namely the dielectric properties, are assessed by carrying out capacitance-voltage (C-V) measurements on metal-oxide-semiconductor (MOS) capacitor structures.

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