We thank Reinhold Meissner for his invaluable technical support. This work was supported by the German Science Foundation via the DFG Projects NI 616/11-1 (Hamburg) and HE 2100/8-1 (Halle).
Stoichiometry of Nickel Oxide Films Prepared by ALD†
Article first published online: 1 SEP 2011
Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Volume 17, Issue 7-9, pages 177–180, September, 2011
How to Cite
Bachmann, J., Zolotaryov, A., Albrecht, O., Goetze, S., Berger, A., Hesse, D., Novikov, D. and Nielsch, K. (2011), Stoichiometry of Nickel Oxide Films Prepared by ALD. Chem. Vap. Deposition, 17: 177–180. doi: 10.1002/cvde.201004300
- Issue published online: 22 SEP 2011
- Article first published online: 1 SEP 2011
- Manuscript Revised: 27 APR 2011
- Manuscript Received: 11 NOV 2010
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