This work was supported by the National Polytechnic Institute of Toulouse through a Bonus Qualité Recherche grant. We are indebted to Mr. Daniel Sadowski and to Miss Rosalia Vasquez Perez for technical assistance.
Local Kinetic Modeling of Aluminum Oxide Metal-Organic CVD From Aluminum Tri-isopropoxide†
Article first published online: 31 AUG 2011
Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Volume 17, Issue 7-9, pages 181–185, September, 2011
How to Cite
Vergnes, H., Samélor, D., Gleizes, A. N., Vahlas, C. and Caussat, B. (2011), Local Kinetic Modeling of Aluminum Oxide Metal-Organic CVD From Aluminum Tri-isopropoxide. Chem. Vap. Deposition, 17: 181–185. doi: 10.1002/cvde.201004301
- Issue published online: 22 SEP 2011
- Article first published online: 31 AUG 2011
- Manuscript Revised: 27 APR 2011
- Manuscript Received: 17 DEC 2010
- Aluminium oxide;
- Aluminium tri-isopropoxide;
A numerical model for the MetalOrganic CVD of alumina from aluminium tri-isopropoxide (ATI), based on an apparent heterogeneous kinetic law was developed using the Computational Fluid Dynamics (CFD) code Fluent. The kinetic parameters were fitted from experimental deposition rates obtained between 360°C and 496°C at a total pressure of 5Torr. Simulated local profiles of alumina deposition rate allowed reproducing the non uniformity of experimental deposition rates due to the dominance of convective gas transport and the depletion of ATI.