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Methylated [(benzene)(1,3-butadiene)Ru0] Derivatives as Novel MOCVD Precursors with Favorable Properties†‡

  1. Ilona Jipa1,
  2. M. Aslam Siddiqi2,
  3. Rehan A. Siddiqui2,
  4. Burak Atakan2,
  5. Hubertus Marbach3,
  6. Till Cremer3,
  7. Florian Maier3,
  8. Hans-Peter Steinrück3,
  9. Katia Danova4,
  10. Nadejda Popovska4,
  11. Frank W. Heinemann1,
  12. Ulrich Zenneck1,*

Article first published online: 16 MAR 2011

DOI: 10.1002/cvde.201006853

Issue

Chemical Vapor Deposition

Chemical Vapor Deposition

Volume 17, Issue 1-3, pages 15–21, March 2011

Additional Information

How to Cite

Jipa, I., Siddiqi, M. A., Siddiqui, R. A., Atakan, B., Marbach, H., Cremer, T., Maier, F., Steinrück, H.-P., Danova, K., Popovska, N., Heinemann, F. W. and Zenneck, U. (2011), Methylated [(benzene)(1,3-butadiene)Ru0] Derivatives as Novel MOCVD Precursors with Favorable Properties. Chem. Vap. Deposition, 17: 15–21. doi: 10.1002/cvde.201006853

Author Information

  1. 1

    Department Chemie und Pharmazie and Interdisciplinary Center for Molecular Materials (ICMM) Universität Erlangen-Nürnberg Egerlandstraße 1, D-91058 Erlangen (Germany)

  2. 2

    Thermodynamik und CeNIDE, IVG, Abteilung Maschinenbau, Fachbereich Ingenieurwissenschaften, Universität Duisburg-Essen Lotharstr. 1, D-47057 Duisburg (Germany)

  3. 3

    Department Chemie und Pharmazie, Lehrstuhl für Physikalische Chemie II, Universität Erlangen-Nürnberg Egerlandstraße 1, D-91058 Erlangen (Germany)

  4. 4

    Department Chemie und Bioingenieurwesen, Lehrstuhl für Chemische Reaktionstechnik, Universität Erlangen-Nürnberg Egerlandstraße 3, D-91058 Erlangen (Germany)

*Department Chemie und Pharmazie and Interdisciplinary Center for Molecular Materials (ICMM) Universität Erlangen-Nürnberg Egerlandstraße 1, D-91058 Erlangen (Germany).

  1. †

    Dedicated to Professor Rudi van Eldik on the occasion of his 65th birthday.

  2. ‡

    Generous financial support by the Deutsche Forschungsgemeinschaft (DFG) through the priority program SPP 1119 and grant MA 4246/1-1 and the Fonds der Chemischen Industrie is gratefully acknowledged. We thank Elisabeth Zillner and Karin Titze for their valuable experimental contributions.

Publication History

  1. Issue published online: 16 MAR 2011
  2. Article first published online: 16 MAR 2011
  3. Manuscript Revised: 13 AUG 2010
  4. Manuscript Received: 31 MAR 2010

Funded by

  • Deutsche Forschungsgemeinschaft (DFG). Grant Numbers: SPP 1119, MA 4246/1-1
  • Fonds der Chemischen Industrie

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Keywords:

  • MOCVD;
  • Precursor complexes;
  • Ruthenium thin film;
  • Thermal behavior;
  • XPS

Abstract

[(Benzene)(2-methyl-1,3-butadiene)Ru0] (1), [(benzene)(2,3-dimethyl-1,3-butadiene)Ru0] (2), and [(2,3-dimethyl-1,3-butadiene)(toluene)Ru0] (3) are prepared and tested as new metal-organic (MO) ruthenium precursor complexes with favorable deposition properties for the CVD of thin ruthenium films. X-ray diffraction (XRD) studies of single crystals of the complexes are characteristic for true Ru0 π-complexes without molecular structure peculiarities or significant intermolecular interactions in the solid state, which can hinder undecomposed evaporation. Differential thermal analysis (DTA) and vapor pressure data qualify the compounds as almost ideal MOCVD precursors. Thin ruthenium films are deposited successfully on silicon wafers at substrate temperatures between 200 and 400 °C in a nitrogen gas atmosphere. X-ray photoelectron spectroscopy (XPS), four-point probe conductivity measurements, and atomic force microscopy (AFM) are used to characterize the films. All films consist of polycrystalline metallic ruthenium with a low surface roughness.

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