The authors acknowledge STMicroelectronics, “Rhône-Alpes” French territorial community, and CNRS for sponsoring this study.
Developments of TaN ALD Process for 3D Conformal Coatings†
Article first published online: 15 DEC 2011
Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Volume 17, Issue 10-12, pages 284–295, December, 2011
How to Cite
Brizé, V., Prieur, T., Violet, P., Artaud, L., Berthomé, G., Blanquet, E., Boichot, R., Coindeau, S., Doisneau, B., Farcy, A., Mantoux, A., Nuta, I., Pons, M. and Volpi, F. (2011), Developments of TaN ALD Process for 3D Conformal Coatings. Chem. Vap. Deposition, 17: 284–295. doi: 10.1002/cvde.201100045
- Issue published online: 15 DEC 2011
- Article first published online: 15 DEC 2011
- Manuscript Revised: 29 JUL 2011
- Manuscript Received: 20 DEC 2010
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