This work has been supported by the French Midi Pyrénées region council.
Modeling of Silicon CVD into Agglomerates of Sub-micrometer-size Particles in a Fluidized Bed†
Article first published online: 15 DEC 2011
Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Volume 17, Issue 10-12, pages 305–311, December, 2011
How to Cite
Reuge, N. and Caussat, B. (2011), Modeling of Silicon CVD into Agglomerates of Sub-micrometer-size Particles in a Fluidized Bed. Chem. Vap. Deposition, 17: 305–311. doi: 10.1002/cvde.201106888
- Issue published online: 15 DEC 2011
- Article first published online: 15 DEC 2011
- Manuscript Revised: 7 FEB 2011
- Manuscript Received: 20 OCT 2010
- Fluidized bed;
The aim of the present study is to better understand the mechanisms involved during silicon deposition from silane, SiH4, into agglomerates of sub-micrometer-size particles treated by fluidized bed (FB)CVD. Two models of silicon deposition into agglomerates assumed either stable, or in permanent formation/desegregation, are developed. In the first case, classical equations of diffusion/reaction in a porous medium are solved, whereas in the second case, the multifluid Eulerian code, MFIX, is used. By comparison with experimental energy dispersive X-ray (EDX) data, modeling results show that the limiting step is not gaseous diffusion into the agglomerates. Very high local deposition rates near the silane entrance probably explain their formation. These results allow us to propose original deposition conditions involving much lower local deposition rates, which should limit agglomeration due to CVD.