The influence of the processing parameters on conformality is studied for pulsed-pressure (PP) metal-organic (MO)CVD. A statistical method to measure conformality, and a model for pulse vapor exposure are presented. Titanium dioxide (TiO2) thin films are deposited from a liquid titanium isopropoxide (TTIP, Ti(OPr)4) solution with no carrier gas on silicon and silicon nitride substrates with 3-D micrometer- and nanometer-scale structures. The deposited films are columnar anatase TiO2 with thicknesses between 130 nm and 310 nm, controlled by the number of pulses. The statistical conformality varies from 0.81 to 0.93, decreased slightly with increasing deposition temperature, and is insensitive to pulse exposure.