This work was supported by Enterprise Ireland CCAN EI project (CC_/2008/0503.B), the Science Foundation Ireland under the CSET scheme and the Embark initiative under the IRCSET scheme.
Remote Plasma-Assisted CVD Growth of Carbon Nanotubes in an Optimised Rapid Thermal Reactor†
Article first published online: 6 MAR 2012
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Volume 18, Issue 1-3, pages 17–21, March 2012
How to Cite
Peltekis, N., Mausser, M., Kumar, S., McEvoy, N., Murray, C. and Duesberg, G. S. (2012), Remote Plasma-Assisted CVD Growth of Carbon Nanotubes in an Optimised Rapid Thermal Reactor. Chem. Vap. Deposition, 18: 17–21. doi: 10.1002/cvde.201106925
- Issue published online: 16 MAR 2012
- Article first published online: 6 MAR 2012
- Manuscript Revised: 16 JUL 2011
- Manuscript Received: 24 FEB 2011
The advances in the use of a remote plasma in combination with a rapid radiative reactor in plasma-enhanced (PE) CVD is presented here. The characteristics and parameters of this system are fully analyzed and compared with conventional CVD growth methods. Growth of multi- and single-walled carbon nanotubes (CNTs) at low temperatures with high quality and reproducibility has been achieved in this way. Further, a new catalytic system, which gives dense multi-wall CNTs on metal substrates, is presented.