Silicon-Included Graphite Films Prepared by Thermally Induced CVD with a (C6F5)4Si Precursor
Article first published online: 7 MAY 2012
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Volume 18, Issue 4-6, pages 166–172, June 2012
How to Cite
Bakovets, V. V., Zelenina, L. N., Levashova, T. M. and Uskov, E. M. (2012), Silicon-Included Graphite Films Prepared by Thermally Induced CVD with a (C6F5)4Si Precursor. Chem. Vap. Deposition, 18: 166–172. doi: 10.1002/cvde.201106929
- Issue published online: 6 JUN 2012
- Article first published online: 7 MAY 2012
- Manuscript Revised: 20 JAN 2012
- Manuscript Received: 24 MAR 2011
Options for accessing this content:
- If you have access to this content through a society membership, please first log in to your society website.
- If you would like institutional access to this content, please recommend the title to your librarian.
- Login via other institutional login options http://onlinelibrary.wiley.com/login-options.
- You can purchase online access to this Article for a 24-hour period (price varies by title)
- If you already have a Wiley Online Library or Wiley InterScience user account: login above and proceed to purchase the article.
- New Users: Please register, then proceed to purchase the article.
Login via OpenAthens
Search for your institution's name below to login via Shibboleth.
Registered Users please login:
- Access your saved publications, articles and searches
- Manage your email alerts, orders and subscriptions
- Change your contact information, including your password
Please register to:
- Save publications, articles and searches
- Get email alerts
- Get all the benefits mentioned below!