This work was performed in the frame of the Research Group (GdR) “SURfaces de GEométrie COmplexe” (SURGECO) funded by CNRS. Karine Blary and the IEMN Lille are acknowledged for the fabrication of the patterned substrates.
Conformity of Aluminum Thin Films Deposited onto Micro-Patterned Silicon Wafers by Pulsed Laser Deposition, Magnetron Sputtering, and CVD†
Article first published online: 15 DEC 2011
Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Volume 17, Issue 10-12, pages 366–374, December, 2011
How to Cite
Thomann, A.-L., Vahlas, C., Aloui, L., Samelor, D., Caillard, A., Shaharil, N., Blanc, R. and Millon, E. (2011), Conformity of Aluminum Thin Films Deposited onto Micro-Patterned Silicon Wafers by Pulsed Laser Deposition, Magnetron Sputtering, and CVD. Chem. Vap. Deposition, 17: 366–374. doi: 10.1002/cvde.201106936
- Issue published online: 15 DEC 2011
- Article first published online: 15 DEC 2011
- Manuscript Revised: 15 SEP 2011
- Manuscript Received: 17 MAY 2011
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