This work was supported by the Technology Innovation Program (Industrial Strategic technology development program, 10035430, Development of reliable fine-pitch metallization technologies) funded by the Ministry of Knowledge Economy (MKE, Korea). XRR analysis was performed at 3C2 XRD beamline of Pohang Light Source.
Initial Stage Growth during Plasma-Enhanced Atomic Layer Deposition of Cobalt†
Version of Record online: 5 MAR 2012
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Chemical Vapor Deposition
Volume 18, Issue 1-3, pages 41–45, March 2012
How to Cite
Lee, H.-B.-R., Park, Y. J., Baik, S. and Kim, H. (2012), Initial Stage Growth during Plasma-Enhanced Atomic Layer Deposition of Cobalt. Chem. Vap. Deposition, 18: 41–45. doi: 10.1002/cvde.201106937
- Issue online: 16 MAR 2012
- Version of Record online: 5 MAR 2012
- Manuscript Revised: 31 AUG 2011
- Manuscript Received: 1 JUN 2011
- Ministry of Knowledge Economy (MKE, Korea). Grant Number: 10035430
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