The Preparation of Titanium Dioxide Gas Sensors by the Electric Field Assisted Aerosol CVD Reaction of Titanium Isopropoxide in Toluene

Authors

  • Naitik Panjawi,

    1. Department of Chemistry, University College London, Christopher Ingold Laboratories 20 Gordon Street, London WC1H 0AJ (United Kingdom)
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  • Anupriya Naik,

    1. Department of Chemistry, University College London, Christopher Ingold Laboratories 20 Gordon Street, London WC1H 0AJ (United Kingdom)
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  • Michael E. A. Warwick,

    1. Department of Chemistry, University College London, Christopher Ingold Laboratories 20 Gordon Street, London WC1H 0AJ (United Kingdom)
    2. UCL Energy Institute Central House, 14 Upper Woburn Place, London, WC1H 0HY (United Kingdom)
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  • Geoffrey Hyett,

    1. School of Chemistry, University of Leeds Leeds, LS2 9JT (United Kingdom)
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  • Russell Binions

    Corresponding author
    1. Department of Chemistry, University College London, Christopher Ingold Laboratories 20 Gordon Street, London WC1H 0AJ (United Kingdom)
    2. School of Engineering and Materials Science, Queen Mary University of London Mile End Road, London E1 4NS (United Kingdom)
    • Department of Chemistry, University College London, Christopher Ingold Laboratories 20 Gordon Street, London WC1H 0AJ (United Kingdom)
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  • RB thanks the Royal Society for a Dorothy Hodgkin fellowship and the EPSRC for financial support (grant number EP/H005803/1). Mr. Kevin Reeves is thanked for invaluable assistance with electron microscopy. This article is part of a special section on the CVD of TiO2 and Doped TiO2 Films.

Abstract

Thin films of titanium dioxide are deposited on gas-sensor substrates at 450 °C from the aerosol-assisted (AA)CVD of titanium isopropoxide solutions in toluene under the influence of electric fields. Electric fields are generated by applying a potential difference between the inter-digitated electrodes of the gas-sensor substrate during the deposition. The deposited films are analyzed and characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), and Raman spectroscopy (RS). It is found that an increase in electric field strength during deposition causes changes in the film microstructure, preferential orientation, and growth rate. The gas-sensor properties of the films are also examined. It is found that applying an electric field during the deposition improves the film microstructure and leads to a two-fold enhancement in the sensing properties of the film.

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